Evolution of nanotracks in silicon nitride under intense electronic excitation: Role of H evolution and a concomitant dynamic electronic energy loss

R R. K. Bommali (Department of Physics, St. Xavier's College Ranchi 4 , Ranchi 834001, Jharkhand,) H Harsh Gupta (Department of Electrical Engineering, School of Computation, Information and Technology, Technical University of Munich 1 , Munich,) A Aman Singh R Rafael Perez Casero (Department of Applied Physics, Universidad Autonoma de Madrid 4 , Madrid 28049,) S Saif Ahmad Khan (Materials Science Division, Inter-University Accelerator Centre (IUAC), Aruna Asaf Ali Marg 5 , New Delhi 110067,) P P. Srivastava S S. Ghosh

Abstract

Exposure to intense electronic excitation in PECVD-grown amorphous hydrogenated silicon nitride (a-SiNx:H) thin films with 100 MeV Ni7+ results in the formation of continuous nanoscale ion track structures at the lower fluence of 5 × 1012 ions/cm2, whereas at the higher fluence of 1 × 1014 ions/cm2, the track structures fragment into discontinuous ion track-like structures. Concomitantly, the diameter of the ion tracks is also found to increase with fluence. The observation of the discontinuous ion track-like structures at the high fluence of 1 × 1014 ions/cm2 suggests that higher fluence irradiation may not always lead to dissolution of the microstructure formed at lower fluence. The results are understood on the basis of a dynamic electronic energy loss (Se) during the course of irradiation and a continuously evolving density resulting from the out-diffusion of hydrogen from the a-SiNx:H films. The proposed mechanism of ion track evolution is supported by the thermal spike simulations.

Article Details

Volume / Issue Vol. 137, Issue 20
Published May 28, 2025
ISSN 0021-8979
Publisher American Institute of Physics

Journal Info

Journal of Applied Physics

American Institute of Physics

ISSN: 0021-8979 Physical Sciences

Authors (7)

R

R. K. Bommali

Department of Physics, St. Xavier's College Ranchi 4 , Ranchi 834001, Jharkhand,

H

Harsh Gupta

Department of Electrical Engineering, School of Computation, Information and Technology, Technical University of Munich 1 , Munich,

A

Aman Singh

R

Rafael Perez Casero

Department of Applied Physics, Universidad Autonoma de Madrid 4 , Madrid 28049,

S

Saif Ahmad Khan

Materials Science Division, Inter-University Accelerator Centre (IUAC), Aruna Asaf Ali Marg 5 , New Delhi 110067,

P

P. Srivastava

S

S. Ghosh