Enhancing uniformity in HARC etching via edge bias voltage and structural impedance variations in a rectangular voltage waveform
C
Chanho Park
(Department of Chemistry, Korea Advanced Institute of Science and Technology (KAIST), 291 Daehak-ro, Yuseong-gu, Daejeon 34141, Republic of Korea)
J
Jinill Cho
J
Junghwan Um
T
Taesung Kim
Article Details
Journal
Scientific Reports
Volume / Issue
Vol. 16, Issue 1
Published
January 20, 2026
ISSN
2045-2322
Publisher
Nature Portfolio
Authors (4)
C
Chanho Park
Department of Chemistry, Korea Advanced Institute of Science and Technology (KAIST), 291 Daehak-ro, Yuseong-gu, Daejeon 34141, Republic of Korea
J
Jinill Cho
J
Junghwan Um
T
Taesung Kim
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