Enhanced second-harmonic generation from WS2/ReSe2 heterostructure

K Kanchan Shaikh (Department of Chemistry, University of Michigan 1 , Ann Arbor, Michigan 48109,) T Taejun Yoo (Department of Chemistry, University of Michigan 1 , Ann Arbor, Michigan 48109,) Z Zeyuan Zhu (Department of Chemistry, University of Michigan 1 , Ann Arbor, Michigan 48109,) Q Qiuyang Li A Amalya C. Johnson H Hui Deng F Fang Liu Y Yuki Kobayashi

Abstract

Van der Waals stacking presents new opportunities for nonlinear optics with its remarkable tunability and scalability. However, the fundamental role of interlayer interactions in modifying the overall nonlinear optical susceptibilities remains elusive. In this paper, we report anisotropic enhancement of second-harmonic generation (SHG) from a WS2/ReSe2 heterobilayer, where the individual composite layers possess distinctive crystal phases. We investigate polarization-resolved response and twist-angle dependence in SHG and reveal that band alignment alone is insufficient to explain the observed anisotropy in the modified SHG response. Spectral shifts in excitonic features highlight band renormalization, supporting the role of hybridization between the two layers. Furthermore, SHG enhancement is highly anisotropic and can even be suppressed in some orientations, suggesting possible intensity-borrowing mechanisms within the heterostructure. Our work demonstrates the ability to tune both the intensity and polarization dependence of nonlinear optical responses with van der Waals stacking of distinctive crystal phases.

Article Details

Volume / Issue Vol. 164, Issue 10
Published March 14, 2026
ISSN 0021-9606
Publisher American Institute of Physics

Journal Info

The Journal of Chemical Physics

American Institute of Physics

ISSN: 0021-9606 Physical Sciences

Authors (8)

K

Kanchan Shaikh

Department of Chemistry, University of Michigan 1 , Ann Arbor, Michigan 48109,

T

Taejun Yoo

Department of Chemistry, University of Michigan 1 , Ann Arbor, Michigan 48109,

Z

Zeyuan Zhu

Department of Chemistry, University of Michigan 1 , Ann Arbor, Michigan 48109,

Q

Qiuyang Li

A

Amalya C. Johnson

H

Hui Deng

F

Fang Liu

Y

Yuki Kobayashi