Emergence of anomalous Hall effect in Mn-doped kagome antiferromagnet FeSn thin films

G G. Y. Xi (School of Physics, Zhejiang University 1 , Hangzhou 310027,) H H. Y. Yang (College of Materials and Environmental Engineering, Hangzhou Dianzi University 5 , Hangzhou 310012,) Y Y. C. Zhang (China Electronic Product Reliability and Environmental Testing Research Institute 1 , Guangzhou 511370,) G G. F. Chen (School of Physics, Zhejiang University 1 , Hangzhou 310027,) J J. Y. He (Department of Physics, School of Science, Westlake University 2 , Hangzhou 310024,) Z Z. G. G. Leng (Department of Physics, School of Science, Westlake University 2 , Hangzhou 310024,) J J. Wu

Abstract

Kagome magnets provide a fertile platform for exploring the interplay between magnetic order and Berry-curvature-driven transport. Here, we report a systematic investigation of the structural, magnetic, and transport properties of epitaxial FeSn and Mn-doped Fe1−xMnxSn (x = 0.3) thin films grown on LaAlO3(111) substrates by molecular beam epitaxy. High crystalline quality and well-defined interfaces provide a reliable basis for a direct comparison between the collinear antiferromagnetic parent compound and its chemically substituted counterpart. While pristine FeSn exhibits compensated antiferromagnetism and a purely ordinary Hall response, Mn substitution induces a weak in-plane ferromagnetic component accompanied by pronounced magnetic anisotropy. Concomitantly, a clear anomalous Hall effect emerges in Fe0.7Mn0.3Sn over a broad temperature range. Scaling analysis of the anomalous Hall conductivity places Mn-doped FeSn in the intrinsic regime, indicating that the anomalous Hall effect is primarily driven by the intrinsic Berry-curvature mechanism, with additional contributions from extrinsic factors such as magnon scattering. These results demonstrate that chemical substitution provides an effective means to activate Berry-curvature-driven transport in a kagome antiferromagnet.

Article Details

Volume / Issue Vol. 139, Issue 15
Published April 21, 2026
ISSN 0021-8979
Publisher American Institute of Physics

Journal Info

Journal of Applied Physics

American Institute of Physics

ISSN: 0021-8979 Physical Sciences

Authors (7)

G

G. Y. Xi

School of Physics, Zhejiang University 1 , Hangzhou 310027,

H

H. Y. Yang

College of Materials and Environmental Engineering, Hangzhou Dianzi University 5 , Hangzhou 310012,

Y

Y. C. Zhang

China Electronic Product Reliability and Environmental Testing Research Institute 1 , Guangzhou 511370,

G

G. F. Chen

School of Physics, Zhejiang University 1 , Hangzhou 310027,

J

J. Y. He

Department of Physics, School of Science, Westlake University 2 , Hangzhou 310024,

Z

Z. G. G. Leng

Department of Physics, School of Science, Westlake University 2 , Hangzhou 310024,

J

J. Wu