Emergence of anomalous Hall effect in Mn-doped kagome antiferromagnet FeSn thin films
Abstract
Kagome magnets provide a fertile platform for exploring the interplay between magnetic order and Berry-curvature-driven transport. Here, we report a systematic investigation of the structural, magnetic, and transport properties of epitaxial FeSn and Mn-doped Fe1−xMnxSn (x = 0.3) thin films grown on LaAlO3(111) substrates by molecular beam epitaxy. High crystalline quality and well-defined interfaces provide a reliable basis for a direct comparison between the collinear antiferromagnetic parent compound and its chemically substituted counterpart. While pristine FeSn exhibits compensated antiferromagnetism and a purely ordinary Hall response, Mn substitution induces a weak in-plane ferromagnetic component accompanied by pronounced magnetic anisotropy. Concomitantly, a clear anomalous Hall effect emerges in Fe0.7Mn0.3Sn over a broad temperature range. Scaling analysis of the anomalous Hall conductivity places Mn-doped FeSn in the intrinsic regime, indicating that the anomalous Hall effect is primarily driven by the intrinsic Berry-curvature mechanism, with additional contributions from extrinsic factors such as magnon scattering. These results demonstrate that chemical substitution provides an effective means to activate Berry-curvature-driven transport in a kagome antiferromagnet.
Article Details
Journal Info
Journal of Applied Physics
American Institute of Physics
Authors (7)
G. Y. Xi
School of Physics, Zhejiang University 1 , Hangzhou 310027,
H. Y. Yang
College of Materials and Environmental Engineering, Hangzhou Dianzi University 5 , Hangzhou 310012,
Y. C. Zhang
China Electronic Product Reliability and Environmental Testing Research Institute 1 , Guangzhou 511370,
G. F. Chen
School of Physics, Zhejiang University 1 , Hangzhou 310027,
J. Y. He
Department of Physics, School of Science, Westlake University 2 , Hangzhou 310024,
Z. G. G. Leng
Department of Physics, School of Science, Westlake University 2 , Hangzhou 310024,
J. Wu