Electrode chemistry impact on retention performance of ferroelectric hafnium zirconium oxide (Hf0.5Zr0.5O2− <i>x</i> ) capacitors

B Benjamin L. Aronson (Department of Materials Science and Engineering, University of Virginia 1 , Charlottesville, Virginia 22904,) E Ece Gunay (Department of Materials Science and Engineering) S Sebastian Calderon N Nikhat Khan (Charles L. Brown Department of Electrical and Computer Engineering, University of Virginia 3 , Charlottesville, Virginia 22904,) S Samantha T. Jaszewski (Department of Materials Science and Engineering, University of Virginia 1 , Charlottesville, Virginia 22904,) M Megan K. Lenox (Department of Materials Science and Engineering, University of Virginia 1 , Charlottesville, Virginia 22904,) F Fernando Vega (School of Mechanical Engineering and Birck Nanotechnology Center, Purdue University 1 , West Lafayette, 47907 Indiana,) L Leonard Jacques (Department of Engineering Science and Mechanics, The Pennsylvania State University, N-246 Millennium Science Complex 1 , University Park, Pennsylvania 16802,) H Helge H. Heinrich (Nanoscale Materials Characterization Facility, University of Virginia 6 , Charlottesville, Virginia 22904,) N Nikhil Shukla (Department of Electrical and Computer Engineering, University of Virginia 1 , Charlottesville, Virginia 22904,) S Susan Trolier-McKinstry T Thomas E. Beechem (School of Mechanical Engineering and Birck Nanotechnology Center, Purdue University 4 , West Lafayette, Indiana 47907,) E Elizabeth C. Dickey J Jon F. Ihlefeld (Department of Materials Science and Engineering, University of Virginia 2 , Charlottesville, Virginia 22904,)

Abstract

Polarization retention of 10 nm thick ferroelectric hafnium zirconium oxide (Hf0.5Zr0.5O2−x, HZO) capacitors with W and TaN electrodes is investigated over temperatures ranging from 85 to 150 °C. Same state and opposite state polarization margins for devices with W electrodes show minimal retention loss after 105 at 150 °C. The devices capped with TaN electrodes show excellent same state retention, but the opposite state polarization margin in the TaN-electrode devices displays 40% retention loss at 150 °C after 105 s. The TaN-capped devices exhibit a more pronounced imprint, which is attributed to an increased oxygen vacancy content (compared to W-capped devices). The increased oxygen vacancy content in the TaN-capped devices is supported by photoluminescence and leakage current measurements. In addition, TaN-capped devices have chemically diffuse electrode–HZO interfaces; more abrupt interfaces are present in the W-capped devices. The presence of interfacial phases in the TaN-capped devices may lead to larger depolarization fields due to reduced charge screening. The results from this study provide further evidence that for HZO ferroelectric devices the electrode can significantly impact polarization retention behavior due to differences in oxygen vacancy concentration and formation of non-ferroelectric interfacial layers.

Article Details

Volume / Issue Vol. 139, Issue 8
Published February 28, 2026
ISSN 0021-8979
Publisher American Institute of Physics

Journal Info

Journal of Applied Physics

American Institute of Physics

ISSN: 0021-8979 Physical Sciences

Authors (14)

B

Benjamin L. Aronson

Department of Materials Science and Engineering, University of Virginia 1 , Charlottesville, Virginia 22904,

E

Ece Gunay

Department of Materials Science and Engineering

S

Sebastian Calderon

N

Nikhat Khan

Charles L. Brown Department of Electrical and Computer Engineering, University of Virginia 3 , Charlottesville, Virginia 22904,

S

Samantha T. Jaszewski

Department of Materials Science and Engineering, University of Virginia 1 , Charlottesville, Virginia 22904,

M

Megan K. Lenox

Department of Materials Science and Engineering, University of Virginia 1 , Charlottesville, Virginia 22904,

F

Fernando Vega

School of Mechanical Engineering and Birck Nanotechnology Center, Purdue University 1 , West Lafayette, 47907 Indiana,

L

Leonard Jacques

Department of Engineering Science and Mechanics, The Pennsylvania State University, N-246 Millennium Science Complex 1 , University Park, Pennsylvania 16802,

H

Helge H. Heinrich

Nanoscale Materials Characterization Facility, University of Virginia 6 , Charlottesville, Virginia 22904,

N

Nikhil Shukla

Department of Electrical and Computer Engineering, University of Virginia 1 , Charlottesville, Virginia 22904,

S

Susan Trolier-McKinstry

T

Thomas E. Beechem

School of Mechanical Engineering and Birck Nanotechnology Center, Purdue University 4 , West Lafayette, Indiana 47907,

E

Elizabeth C. Dickey

J

Jon F. Ihlefeld

Department of Materials Science and Engineering, University of Virginia 2 , Charlottesville, Virginia 22904,