Electrochemical investigation of Donnan exclusion mechanisms in molecular layer-by-layer membranes

J Jizhou Jiang (Department of Chemical and Biomolecular Engineering, University of Notre Dame 1 , Notre Dame, Indiana 46556,) C Carter K. Dauenhauer (Department of Chemical and Biomolecular Engineering, University of Notre Dame 1 , Notre Dame, Indiana 46556,) Y Youngsuk Ko C Casey P. O’Brien (Department of Chemical Engineering, Texas Tech University 2 , Lubbock, Texas 79409,) B Bryan D. Paulsen (Department of Chemical and Biomolecular Engineering, University of Notre Dame 1 , Notre Dame, Indiana 46556,) J Jennifer L. Schaefer (Department of Chemical and Biomolecular Engineering, University of Notre Dame 1 , Notre Dame, Indiana 46556,)

Abstract

Membrane-based separations play a central role in water purification, energy generation, and resource recovery, and their performance is strongly influenced by ion transport through steric, dielectric, and electrostatic interactions. Among these, Donnan exclusion is particularly important for selective ion transport; however, discrepancies between theoretical predictions and experimental results have hindered a comprehensive understanding of this mechanism. Here, we use molecular layer-by-layer assembly to incorporate a carboxylate-bearing diamine, 3,5-diaminobenzoic acid, into polyamide thin films, thereby enabling precise control over fixed-charge density without altering solution pH. Electrochemical impedance spectroscopy measurements demonstrate that variations in membrane resistance directly reflect the impact of Donnan exclusion. To the best of our knowledge, this work provides the first demonstration that the chemically controlled modulation of polyamide charge density can explicitly manifest this mechanism through resistance analysis. While the results reproduce the qualitative trends predicted by the established Donnan/non-Donnan transport theory, they also reveal quantitative deviations that underscore the limitations of its simplifying assumptions.

Article Details

Volume / Issue Vol. 163, Issue 19
Published November 21, 2025
ISSN 0021-9606
Publisher American Institute of Physics

Journal Info

The Journal of Chemical Physics

American Institute of Physics

ISSN: 0021-9606 Physical Sciences

Authors (6)

J

Jizhou Jiang

Department of Chemical and Biomolecular Engineering, University of Notre Dame 1 , Notre Dame, Indiana 46556,

C

Carter K. Dauenhauer

Department of Chemical and Biomolecular Engineering, University of Notre Dame 1 , Notre Dame, Indiana 46556,

Y

Youngsuk Ko

C

Casey P. O’Brien

Department of Chemical Engineering, Texas Tech University 2 , Lubbock, Texas 79409,

B

Bryan D. Paulsen

Department of Chemical and Biomolecular Engineering, University of Notre Dame 1 , Notre Dame, Indiana 46556,

J

Jennifer L. Schaefer

Department of Chemical and Biomolecular Engineering, University of Notre Dame 1 , Notre Dame, Indiana 46556,