Electro-optically triggered VO2 thin film memristor for neuronal logic circuit

C Chhotrai Soren (Department of Materials Science and Engineering, Indian Institute of Technology Delhi 1 , Hauz Khas, New Delhi 110016,) R Rajesh Kumar Jha (Department of Materials Science and Engineering, Indian Institute of Technology Delhi 1 , Hauz Khas, New Delhi 110016,) S Syed A. Bukhari (Texas Instruments 2 , Dallas, Texas 75243,) U Ujjwal Chitnis (Department of Materials Science and Engineering, Indian Institute of Technology Delhi 1 , Hauz Khas, New Delhi 110016,) S Sonika Singh (Department of School of Interdisciplinary Research, Indian Institute of Technology 2 Delhi, New Delhi 110016,) H Hemant Kumar S Surendra Kumar Makineni A Ankur Goswami (Department of Material Science and Engineering, Indian Institute of Technology 1 Delhi, New Delhi 110016,)

Abstract

The artificial neuronal architecture in the form of computational memories is unfolding, obliterating the conventional von Neumann computers, indicating the increase in computing speed and cost. Memristors, with their neuron-mimicking capabilities, have become an important fundamental component in neuronal logic circuits. Transition metal oxides such as VO2 undergo phase change due to the metal-to-insulator transition from tetragonal (R) to monoclinic (M1) when the temperature falls below 340 K. VO2 thin films were grown using pulsed laser deposition, and their switching behavior was observed under different voltage biases. The VO2 thin films were illuminated with laser sources at wavelengths of 405 and 980 nm. A spiking time-dependent analysis was conducted under these various illumination conditions. The results demonstrate the potential for optical-based computing. We have successfully shown that VO2 can be used as a memristor for neuronal logic applications. The ratio of the high-resistance state (RHRS) to the low-resistance state (RLRS) was found to be 6.3 × 103.

Article Details

Volume / Issue Vol. 138, Issue 16
Published October 28, 2025
ISSN 0021-8979
Publisher American Institute of Physics

Journal Info

Journal of Applied Physics

American Institute of Physics

ISSN: 0021-8979 Physical Sciences

Authors (8)

C

Chhotrai Soren

Department of Materials Science and Engineering, Indian Institute of Technology Delhi 1 , Hauz Khas, New Delhi 110016,

R

Rajesh Kumar Jha

Department of Materials Science and Engineering, Indian Institute of Technology Delhi 1 , Hauz Khas, New Delhi 110016,

S

Syed A. Bukhari

Texas Instruments 2 , Dallas, Texas 75243,

U

Ujjwal Chitnis

Department of Materials Science and Engineering, Indian Institute of Technology Delhi 1 , Hauz Khas, New Delhi 110016,

S

Sonika Singh

Department of School of Interdisciplinary Research, Indian Institute of Technology 2 Delhi, New Delhi 110016,

H

Hemant Kumar

S

Surendra Kumar Makineni

A

Ankur Goswami

Department of Material Science and Engineering, Indian Institute of Technology 1 Delhi, New Delhi 110016,