Electrical properties of electrochemically energized n-GaN under reverse-bias conditions
Abstract
Electrochemical energization of n-GaN was conducted under reverse-bias conditions as well as forward-bias conditions that were used in our previous studies for anodization, and electrical properties of energized n-GaN were examined. The surface composition and electrical properties of the energized n-GaN were evaluated by x-ray photoelectron spectroscopy (XPS) and temperature-dependent Hall-effect measurements, respectively. XPS analysis revealed that surface oxidation occurred even under reverse-bias conditions. Furthermore, while the electron concentration slightly increased under forward-bias conditions, it decreased by four to five orders of magnitude under reverse-bias conditions, suggesting significant electron trapping. These results clearly indicate that the effects of electrochemical energization on n-GaN differ significantly between forward- and reverse-bias conditions. Based on these findings, a surface conceptual illustration of n-GaN that explains these results is proposed.
Article Details
Journal Info
Journal of Applied Physics
American Institute of Physics
Authors (9)
Riku Ando
Graduate School of Engineering, Mie University 1 , 1577 Kurimamachiya, Tsu, Mie 514-8507,
Ren Morita
Tokyo University of Technology 2 Department of Electric and Electronic Engineering, , 1404-1 Katakura, Hachioji, Tokyo 192-0982,
Ryuto Iura
Tokyo University of Technology 2 Department of Electric and Electronic Engineering, , 1404-1 Katakura, Hachioji, Tokyo 192-0982,
Yoriko Suda
Tokyo University of Technology 2 Department of Electric and Electronic Engineering, , 1404-1 Katakura, Hachioji, Tokyo 192-0982,
Gaku Kamio
Tokyo University of Technology 2 Department of Electric and Electronic Engineering, , 1404-1 Katakura, Hachioji, Tokyo 192-0982,
Ryota Akaike
Hideto Miyake
Hiroshi Fujioka
Institute of Industrial Science, The University of Tokyo 4 , Tokyo 153-8505,
Narihiko Maeda
Tokyo University of Technology 2 Department of Electric and Electronic Engineering, , 1404-1 Katakura, Hachioji, Tokyo 192-0982,