Efficient Dark Current Suppression by Engineering PIET‐Active Discrete Donor–Acceptor Architecture for High‐Sensitivity Semiconductor Photodetectors

T Tian‐Tian Song (The International Joint Institute of Tianjin University, Fuzhou Tianjin University Tianjin 300072 P. R. China) P Peng‐Kun Wang (State Key Laboratory of Structural Chemistry Fujian Institute of Research on the Structure of Matter Chinese Academy of Sciences Fuzhou Fujian 350108 P. R. China) L Long Chen (Department of Chemistry, Frontiers Science Center for New Organic Matter and State Key Laboratory of Advanced Chemical Power Sources, College of Chemistry) S Shan‐Shan Cheng (The International Joint Institute of Tianjin University, Fuzhou Tianjin University Tianjin 300072 P. R. China) M Ming‐Sheng Wang (State Key Laboratory of Physical Chemistry of Solid Surfaces College of Materials Xiamen University Xiamen China) W Wen‐Ping Hu (The International Joint Institute of Tianjin University, Fuzhou Tianjin University Tianjin 300072 P. R. China)

Abstract

Abstract High‐sensitivity photodetectors are of paramount importance for astronomy, night vision, and bioimaging. Current methods for enhancing sensitivity still face the challenges of complex preparation processes and the dependence on low‐temperature environments. This work demonstrates that constructing a discrete, donor (D)–acceptor (A) structure and employing the photoinduced electron transfer (PIET) technique may simultaneously reduce dark current and increase photocurrent efficiently, thereby significantly enhancing the detection sensitivity. With this synergetic strategy, a viologen‐based photochromic semiconductor with a discrete bismuth halide structure may reduce its dark current by ≈94% —a reduction far exceeding those reported using external field‐induced modification methods—while simultaneously enhancing the photocurrent by ≈83% after PIET and coloration. This value corresponds to a two‐fold increase of the detection sensitivity ( S ). This finding opens a new effective strategy to explore ultra‐highsensitivity photodetectors and smart semiconductors.

Article Details

Volume / Issue Vol. 38, Issue 5
Published January 01, 2026
ISSN 0935-9648
Publisher Unknown Publisher

Journal Info

Advanced Materials

Unknown Publisher

ISSN: 0935-9648 Physical Sciences

Authors (6)

T

Tian‐Tian Song

The International Joint Institute of Tianjin University, Fuzhou Tianjin University Tianjin 300072 P. R. China

P

Peng‐Kun Wang

State Key Laboratory of Structural Chemistry Fujian Institute of Research on the Structure of Matter Chinese Academy of Sciences Fuzhou Fujian 350108 P. R. China

L

Long Chen

Department of Chemistry, Frontiers Science Center for New Organic Matter and State Key Laboratory of Advanced Chemical Power Sources, College of Chemistry

S

Shan‐Shan Cheng

The International Joint Institute of Tianjin University, Fuzhou Tianjin University Tianjin 300072 P. R. China

M

Ming‐Sheng Wang

State Key Laboratory of Physical Chemistry of Solid Surfaces College of Materials Xiamen University Xiamen China

W

Wen‐Ping Hu

The International Joint Institute of Tianjin University, Fuzhou Tianjin University Tianjin 300072 P. R. China