Effective control and probe of Néel order in polycrystalline NiO films: a combined approach to study antiferromagnets

C Chun-Chieh Hsu Y Yu-Chen Lin I I-Yu Cheng S Shuan-Cheng Mai D Danru Qu A Alexander J. Grutter (NIST Center for Neutron Research) M Margaret Kane Y Yuri Suzuki Y Yu-Lon Lin C Chao-Yao Yang

Abstract

Abstract Antiferromagnetic (AFM) materials are promising for next-generation spintronic applications, however, practical implementation remains challenging due to difficulties in controlling the Néel order and the lack of sensitive, device-compatible readout techniques. In this work, we demonstrate spin Hall magnetoresistance (SHMR) as an effective and versatile approach for probing Néel order, even in polycrystalline AFM films. Using NiO/Pt and LaNiO 3 /Pt bilayers as model systems, we show that SHMR measurements can detect the Néel temperature (T N ), monitor spin-flop transition, and reveal field-induced orientation of the Néel order. Crucially, we establish that the control of Néel order with non-volatility is effective when initiated from the “soft” AFM phase at elevated temperature (380 K) via field-cooling (FC), enabling robust alignment of Néel order without the need for adjacent heavy metals as spin current sources. This spin-current-free control greatly expands the flexibility and scalability of AFM device design, especially in the form of polycrystalline microstructure. The results highlight the combined FC and SHMR technique as a powerful and flexible platform for both manipulation and sensitive readout of AFM states, providing a reliable basis for the design and characterization of a broad class of AFM materials and devices.

Article Details

Volume / Issue Vol. 16, Issue 1
Published January 23, 2026
ISSN 2045-2322
Publisher Nature Portfolio

Journal Info

Scientific Reports

Nature Portfolio

ISSN: 2045-2322 Open Access Life Sciences

Authors (10)

C

Chun-Chieh Hsu

Y

Yu-Chen Lin

I

I-Yu Cheng

S

Shuan-Cheng Mai

D

Danru Qu

A

Alexander J. Grutter

NIST Center for Neutron Research

M

Margaret Kane

Y

Yuri Suzuki

Y

Yu-Lon Lin

C

Chao-Yao Yang