Effect of temperature on the electrical performance of GaN Schottky barrier impact ionization avalanche transit time diodes

X Xuan Huang (State Key Laboratory of Physical Chemistry of Solid Surfaces, College of Chemistry and Chemical Engineering) L Lin-An Yang (School of Microelectronics, Xidian University 1 , Xi'an 710071,) J Jian-Hua Zhou (State Key Laboratory of Wide-bandgap Semiconductor Devices and Integrated Technology, School of Microelectronics, Xidian University , Xi’an 710071,) X Xin-Yi Wang X Xiao-Hua Ma (School of Microelectronics, Xidian University 1 , Xi'an 710071,) Y Yue Hao

Abstract

This article investigates the effect of temperature on GaN Schottky barrier Impact Ionization Avalanche Transit Time diodes by Sentaurus TCAD simulations. The findings indicate that Thermal Field Emission increases and the electron saturation velocity decreases with temperature, reducing the avalanche injection phase delay and leading to the transit phase delay exceeding its optimal value. These factors impair the performance of oscillation initiation and conversion output with a shift of bandwidth and optimal frequency towards lower values. Specifically, the start-up efficiency and speed decrease by 69% and 80%, while radio frequency power and efficiency drop by 32% and 41% at the design frequency of 120 GHz under 500 °C. Additionally, the proportion of radio frequency conversion power lost through parasitic resistance increases threefold, and the stability of radio frequency oscillations diminishes by 70%. Therefore, it is recommended to maintain a low junction temperature whenever possible to ensure optimal device performance. In cases where high junction temperatures are unavoidable, reducing the thickness of the drift layer can compensate for the excess transit phase delay, thereby improving performance.

Article Details

Volume / Issue Vol. 137, Issue 12
Published March 28, 2025
ISSN 0021-8979
Publisher American Institute of Physics

Journal Info

Journal of Applied Physics

American Institute of Physics

ISSN: 0021-8979 Physical Sciences

Authors (6)

X

Xuan Huang

State Key Laboratory of Physical Chemistry of Solid Surfaces, College of Chemistry and Chemical Engineering

L

Lin-An Yang

School of Microelectronics, Xidian University 1 , Xi'an 710071,

J

Jian-Hua Zhou

State Key Laboratory of Wide-bandgap Semiconductor Devices and Integrated Technology, School of Microelectronics, Xidian University , Xi’an 710071,

X

Xin-Yi Wang

X

Xiao-Hua Ma

School of Microelectronics, Xidian University 1 , Xi'an 710071,

Y

Yue Hao