Effect of recording layer thickness on reducing switching current in double MgO/CoFeB interfaces pMTJ
Abstract
The effect of the recording layer thickness (t) on the quasi-static switching characteristics in the double MgO/CoFeB interfaces perpendicular magnetic tunnel junctions with the [Co/Pt]n-based synthetic antiferromagnetic structures has been investigated. It is apparent that the switching current drops rapidly either with slightly increasing the bottom CoFeB thickness (tCoFeB ≥ 1.15 nm) or inserted Ta thickness (tTa ≥ 0.3 nm), or with marginally decreasing the upper CoFeB thickness (tCoFeB ≤ 0.75 nm), even acquiring a maximum reduction of 41.8%. The tuning mechanism of the write energy dissipation at a specific pulse width can be attributed to two parts. One is an intrinsic leverage of the effective ferromagnetic volume, spontaneous magnetization, and magnetic anisotropy field in the recording layers with a view to their dead layer. The secondary contributors may be closely related to the discrepancy between the resistance-area products of the perpendicular magnetic tunnel junction devices with the six different stack designs. Our results are instructive to the future development of practical ultralow-power chips in binary memory and logical computation fields.
Article Details
Journal Info
Journal of Applied Physics
American Institute of Physics
Authors (4)
Lili Lang
State Key Laboratory of Materials for Integrated Circuits, Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences , 865 Changning Road, Shanghai 200050
Yujie Jiang
State Key Laboratory of Synergistic Chem-Bio Synthesis, Shanghai Key Laboratory for Molecular Engineering of Chiral Drugs, School of Chemistry and Chemical Engineering
Cailu Wang
State Key Laboratory of Materials for Integrated Circuits, Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences , 865 Changning Road, Shanghai 200050
Yemin Dong
State Key Laboratory of Materials for Integrated Circuits, Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences , 865 Changning Road, Shanghai 200050