Effect of a uniaxial strain on cubic semiconductors: Toward control of the hole spin–orbit interaction

T T. Amand (Laboratoire de Physique et Chimie des Nano-objets, Université de Toulouse, INSA-CNRS-UPS, LPCNO 1 , 135 Ave. Rangueil, 31077 Toulouse,) D D. Paget (Laboratoire de Physique de la Matière Condensée, CNRS, Ecole Polytechnique, Institut Polytechnique de Paris 2 , 91120 Palaiseau,)

Abstract

In cubic semiconductors such as GaAs under uniaxial strain, we determine the spin–orbit equivalent magnetic field acting on hole spins. This field is the sum of a Dresselhaus-like field caused by the lack of inversion symmetry and of a contribution proportional to the strain. Depending on the strain orientation, along [0 0 1], [1 1 1], or [1¯10], and on whether the holes are heavy or light, three types of novel effects can be predicted: (i) It is possible to suppress the valence spin–orbit interaction for all values of momentum. (ii) By tuning the strain, one can reach a SU(2) symmetry among the heavy or light valence bands, thus opening the possibility to observe a hole-related persistent spin helix. (iii) Finally, for heavy holes under strain along [111] (Z direction), the spin–orbit field lies along Z and only depends on kZ. This implies that the Z component of the hole spin is not affected by spin–orbit-related relaxation, thus leading to an orientation anisotropy of this relaxation. Conversely, for light holes, it is orthoradial in the XY plane, and its length is proportional to the modulus k⊥ of the transverse wave vector.

Article Details

Volume / Issue Vol. 139, Issue 18
Published May 14, 2026
ISSN 0021-8979
Publisher American Institute of Physics

Journal Info

Journal of Applied Physics

American Institute of Physics

ISSN: 0021-8979 Physical Sciences

Authors (2)

T

T. Amand

Laboratoire de Physique et Chimie des Nano-objets, Université de Toulouse, INSA-CNRS-UPS, LPCNO 1 , 135 Ave. Rangueil, 31077 Toulouse,

D

D. Paget

Laboratoire de Physique de la Matière Condensée, CNRS, Ecole Polytechnique, Institut Polytechnique de Paris 2 , 91120 Palaiseau,