Dry resist lamination for wafer-scale fabrication of microfluidic superfusion devices
R
Rui Liu
E
Esteban Pedrueza-Villalmanzo
A
Aldo Jesorka
Abstract
Abstract We present a cleanroom fabrication process of free-standing open space microfluidic devices with channel widths of ~ 30 µm on the wafer scale by means of photolithography in combination with lamination technology.
Article Details
Journal
Scientific Reports
Volume / Issue
Vol. 15, Issue 1
Published
September 25, 2025
ISSN
2045-2322
Publisher
Nature Portfolio
Authors (3)
R
Rui Liu
E
Esteban Pedrueza-Villalmanzo
A
Aldo Jesorka
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