Discovery of van Hove singularities: electronic fingerprints of 3Q magnetic order in a van der Waals quantum magnet

H Hai-Lan Luo J Josue Rodriguez D Debasis Dutta M Maximilian Huber H Haoyue Jiang L Luca Moreschini C Catherine Xu A Alexei Fedorov C Chris Jozwiak (Advanced Light Source, Lawrence Berkeley National Laboratory) A Aaron Bostwick (Advanced Light Source, Lawrence Berkeley National Laboratory) G Guoqing Chang J James G. Analytis D Dung-Hai Lee A Alessandra Lanzara (Materials Sciences Division)

Abstract

Abstract Magnetically intercalated transition metal dichalcogenides are emerging as a rich platform for exploring exotic quantum states in van der Waals magnets. Among them, Co x TaS 2 has attracted intense interest following the recent discovery of a distinctive 3 Q magnetic ground state and a pronounced topological Hall effect below a critical doping of x  ≈ 1/3, both intimately tied to cobalt concentration. To date, direct signatures of this enigmatic 3 Q magnetic order in the electronic structure remain elusive. Here we report a comprehensive doping dependent angle resolved photoemission spectroscopy study that unveils these long-sought fingerprints. Our data reveal an unexpected inverse-Mexican-hat dispersion along the K-M- $${\mathrm{K}}^{\prime}$$ K ′ direction, accompanied by two van Hove singularities. These features are consistent with theoretical predictions for a 3 Q magnetic order near three-quarters band filling on a cobalt triangular lattice. These results provide evidence of 3 Q magnetic order in the electronic structure, establishing TMD van der Waals magnets as tunable materials to explore the interplay between magnetism and topology.

Article Details

Volume / Issue Vol. 17, Issue 1
Published March 07, 2026
ISSN 2041-1723
Publisher Nature Portfolio

Journal Info

Nature Communications

Nature Portfolio

ISSN: 2041-1723 Open Access Life Sciences

Authors (14)

H

Hai-Lan Luo

J

Josue Rodriguez

D

Debasis Dutta

M

Maximilian Huber

H

Haoyue Jiang

L

Luca Moreschini

C

Catherine Xu

A

Alexei Fedorov

C

Chris Jozwiak

Advanced Light Source, Lawrence Berkeley National Laboratory

A

Aaron Bostwick

Advanced Light Source, Lawrence Berkeley National Laboratory

G

Guoqing Chang

J

James G. Analytis

D

Dung-Hai Lee

A

Alessandra Lanzara

Materials Sciences Division