Different temperatures leakage mechanisms of (Al2O3)x(HfO2)1−x gate Dielectrics deposited by atomic layer deposition

Y Yifan Jia Y Yi Fu X Xiangtai Liu Z Zhan Wang P Pengcheng Jiang Q Qin Lu S Shaoqing Wang Y Yunhe Guan L Lijun Li H Haifeng Chen Y Yue Hao

Article Details

Volume / Issue Vol. 15, Issue 1
Published January 07, 2025
ISSN 2045-2322
Publisher Nature Portfolio

Journal Info

Scientific Reports

Nature Portfolio

ISSN: 2045-2322 Open Access Life Sciences

Authors (11)

Y

Yifan Jia

Y

Yi Fu

X

Xiangtai Liu

Z

Zhan Wang

P

Pengcheng Jiang

Q

Qin Lu

S

Shaoqing Wang

Y

Yunhe Guan

L

Lijun Li

H

Haifeng Chen

Y

Yue Hao