Defining the Reversible Limit of Anionic Redox via Interlayer Li Ordering
Y
Yuansheng Shi
(School of Materials Science and Engineering, Nanyang Technological University, 50 Nanyang Avenue, Singapore 639798, Singapore)
P
Pengfeng Jiang
(School of Materials)
F
Fushan Geng
(Shanghai Key Laboratory of Magnetic Resonance, Institute of Magnetic Resonance and Molecular Imaging in Medicine, School of Physics)
J
Jue Liu
K
Kaili Li
(School of Materials)
J
Jinfeng Dong
(School of Materials Science and Engineering, Nanyang Technological University, 50 Nanyang Avenue, Singapore 639798, Singapore)
J
Jiaqi Cao
(School of Materials)
X
Xia Lu
(School of Materials)
Q
Qingyu Yan
(School of Materials Science and Engineering, Nanyang Technological University, 50 Nanyang Avenue, Singapore 639798, Singapore)
Article Details
Volume / Issue
Vol. 148, Issue 21
Published
June 03, 2026
Pages
21714-21724
ISSN
0002-7863
Publisher
American Chemical Society
Journal Info
Journal of the American Chemical Society
American Chemical Society
ISSN: 0002-7863 Physical Sciences
Authors (9)
Y
Yuansheng Shi
School of Materials Science and Engineering, Nanyang Technological University, 50 Nanyang Avenue, Singapore 639798, Singapore
P
Pengfeng Jiang
School of Materials
F
Fushan Geng
Shanghai Key Laboratory of Magnetic Resonance, Institute of Magnetic Resonance and Molecular Imaging in Medicine, School of Physics
J
Jue Liu
K
Kaili Li
School of Materials
J
Jinfeng Dong
School of Materials Science and Engineering, Nanyang Technological University, 50 Nanyang Avenue, Singapore 639798, Singapore
J
Jiaqi Cao
School of Materials
X
Xia Lu
School of Materials
Q
Qingyu Yan
School of Materials Science and Engineering, Nanyang Technological University, 50 Nanyang Avenue, Singapore 639798, Singapore
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