Defining the Reversible Limit of Anionic Redox via Interlayer Li Ordering

Y Yuansheng Shi (School of Materials Science and Engineering, Nanyang Technological University, 50 Nanyang Avenue, Singapore 639798, Singapore) P Pengfeng Jiang (School of Materials) F Fushan Geng (Shanghai Key Laboratory of Magnetic Resonance, Institute of Magnetic Resonance and Molecular Imaging in Medicine, School of Physics) J Jue Liu K Kaili Li (School of Materials) J Jinfeng Dong (School of Materials Science and Engineering, Nanyang Technological University, 50 Nanyang Avenue, Singapore 639798, Singapore) J Jiaqi Cao (School of Materials) X Xia Lu (School of Materials) Q Qingyu Yan (School of Materials Science and Engineering, Nanyang Technological University, 50 Nanyang Avenue, Singapore 639798, Singapore)

Article Details

Volume / Issue Vol. 148, Issue 21
Published June 03, 2026
Pages 21714-21724
ISSN 0002-7863
Publisher American Chemical Society

Journal Info

Journal of the American Chemical Society

American Chemical Society

ISSN: 0002-7863 Physical Sciences

Authors (9)

Y

Yuansheng Shi

School of Materials Science and Engineering, Nanyang Technological University, 50 Nanyang Avenue, Singapore 639798, Singapore

P

Pengfeng Jiang

School of Materials

F

Fushan Geng

Shanghai Key Laboratory of Magnetic Resonance, Institute of Magnetic Resonance and Molecular Imaging in Medicine, School of Physics

J

Jue Liu

K

Kaili Li

School of Materials

J

Jinfeng Dong

School of Materials Science and Engineering, Nanyang Technological University, 50 Nanyang Avenue, Singapore 639798, Singapore

J

Jiaqi Cao

School of Materials

X

Xia Lu

School of Materials

Q

Qingyu Yan

School of Materials Science and Engineering, Nanyang Technological University, 50 Nanyang Avenue, Singapore 639798, Singapore