Defect concentration analysis: Combining Laplace deep-level transient spectroscopy with constrained curve fitting
Abstract
Deep-level transient spectroscopy is the standard technique for characterizing electrically active defects in semiconductors. The conventional double-boxcar evaluation fails when multiple defect emissions overlap, causing peak broadening or merging. Two established routes overcome this resolution limitation: The numerical inverse Laplace transform resolves closely spaced emission rates but inherits regularization-dependent peak shapes that bias the recovered amplitudes, particularly for imbalanced peaks, while direct multi-exponential time-domain fitting avoids regularization yet is sensitive to noise and prone to overfitting when rates and amplitudes are determined simultaneously as free parameters. This work presents a two-step evaluation routine that combines Laplace transform analysis with constrained multi-exponential curve fitting of the capacitance transient. The inverse Laplace transform first identifies the emission rates, which are then held fixed in a constrained least-squares fit that recovers the individual amplitudes from the time-domain transient, thereby combining the rate resolution of Laplace DLTS with a noise-robust, regularization-free amplitude determination. The method requires no material-specific assumptions and is applicable wherever Laplace DLTS can resolve multiple defect emission rates, providing a practical tool for quantitative defect concentration analysis in semiconductor development. Validation with synthetic data demonstrates accurate recovery of defect concentrations. Application to n-type GaAs, where the well-known EL2 defect overlaps with the ELO level, reveals ELO at a concentration 20 times lower than that of EL2. Despite this difference, the order-of-magnitude higher capture cross section of ELO renders both defects comparably important for carrier recombination, highlighting the importance of accurate concentration determination via the presented method.
Article Details
Journal Info
Journal of Applied Physics
American Institute of Physics
Authors (3)
Christoph Klein
Fraunhofer Institute for Solar Energy Systems ISE, Division Photovoltaics 1 , Heidenhofstr. 2, 79110 Freiburg,
Carmine Pellegrino
David Lackner