Critical Thickness and Long‐Term Ambient Stability in Superconducting LaPr <sub>2</sub> Ni <sub>2</sub> O <sub>7</sub> Films

Y Yuexin Shi (School of Physics State Key Laboratory for Extreme Photonics and Instrumentation Zhejiang University Hangzhou 310027 China) C Chenyao Song (School of Physics State Key Laboratory for Extreme Photonics and Instrumentation Zhejiang University Hangzhou 310027 China) Y Yingze Jia (Beijing National Laboratory for Condensed Matter Physics Institute of Physics Chinese Academy of Sciences Beijing 100190 China) Y Yanzhi Wang (School of Physics State Key Laboratory for Extreme Photonics and Instrumentation Zhejiang University Hangzhou 310027 China) Q Qi Li Y Ye Chen Y Yue Yang J Junchi Fu (School of Physics State Key Laboratory for Extreme Photonics and Instrumentation Zhejiang University Hangzhou 310027 China) M Ming Qin D Dongsheng Song Z Zhen Chen H Huiqiu Yuan (Center for Correlated Matter, School of Physics) Y Yanwu Xie M Meng Zhang

Abstract

Abstract The recent observation of ambient‐pressure superconductivity in compressively strained (La,Pr) 3 Ni 2 O 7 films marks a significant advance in nickelate superconductivity research. However, their fabrication remains challenging, with reported thickness limited to &lt;6.6 nm and pronounced ambient degradation. In this study, LaPr 2 Ni 2 O 7 films with nominal thicknesses ranging from 3.5 to 23.5 nm are fabricated. Superconductivity is observed in all samples, with a maximum onset transition temperature ( T c ) of 44 K. No systematic correlation between T c and film thickness is identified. Angle‐dependent T c measurements under external magnetic fields and vortex anisotropy analysis indicate 2D superconductivity in all samples. Structural and transport measurements show that superconductivity in LaPr 2 Ni 2 O 7 is confined to within 10 nm of the interface, while thicker films develop a protective (La,Pr) 4 Ni 3 O 10 surface layer that enhances stability. Ex situ amorphous oxide capping layers further suppress superconducting degradation, yielding 10‐fold stability enhancement in ultrathin films (3 ≈ 4 nm) and prolonging stability from 30 to more than 100 days in thicker films.

Article Details

Volume / Issue Vol. 38, Issue 4
Published January 01, 2026
ISSN 0935-9648
Publisher Unknown Publisher

Journal Info

Advanced Materials

Unknown Publisher

ISSN: 0935-9648 Physical Sciences

Authors (14)

Y

Yuexin Shi

School of Physics State Key Laboratory for Extreme Photonics and Instrumentation Zhejiang University Hangzhou 310027 China

C

Chenyao Song

School of Physics State Key Laboratory for Extreme Photonics and Instrumentation Zhejiang University Hangzhou 310027 China

Y

Yingze Jia

Beijing National Laboratory for Condensed Matter Physics Institute of Physics Chinese Academy of Sciences Beijing 100190 China

Y

Yanzhi Wang

School of Physics State Key Laboratory for Extreme Photonics and Instrumentation Zhejiang University Hangzhou 310027 China

Q

Qi Li

Y

Ye Chen

Y

Yue Yang

J

Junchi Fu

School of Physics State Key Laboratory for Extreme Photonics and Instrumentation Zhejiang University Hangzhou 310027 China

M

Ming Qin

D

Dongsheng Song

Z

Zhen Chen

H

Huiqiu Yuan

Center for Correlated Matter, School of Physics

Y

Yanwu Xie

M

Meng Zhang