Contact engineering of metallic Ni-integrated niobium sulfide via H2S treatment for enhanced MoS2 transistor performance and CMOS compatibility
K
Koki Hori
W
Wen Hsin Chang
T
Toshifumi Irisawa
A
Atsushi Ogura
N
Naoya Okada
Article Details
Journal
Scientific Reports
Volume / Issue
Vol. 16, Issue 1
Published
March 08, 2026
ISSN
2045-2322
Publisher
Nature Portfolio
Authors (5)
K
Koki Hori
W
Wen Hsin Chang
T
Toshifumi Irisawa
A
Atsushi Ogura
N
Naoya Okada
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