Compositionally-graded ferroelectric thin films by solution epitaxy produce excellent dielectric stability

R Ruian Zhang C Chen Lin (School of Pharmaceutical Sciences) H Hongliang Dong (Center for High Pressure Science and Technology Advanced Research) H Haojie Han Y Yu Song (Department of Chemistry, College of Science) Y Yiran Sun Y Yue Wang Z Zijun Zhang X Xiaohe Miao Y Yongjun Wu Z Zhe Ren Q Qiaoshi Zeng H Houbing Huang J Jing Ma (State Key Laboratory of Coordination Chemistry, School of Chemistry) H He Tian (Center of Electron Microscopy, School of Materials Science and Engineering, Zhejiang University, Hangzhou, China.) Z Zhaohui Ren G Gaorong Han

Article Details

Volume / Issue Vol. 16, Issue 1
Published January 02, 2025
ISSN 2041-1723
Publisher Nature Portfolio

Journal Info

Nature Communications

Nature Portfolio

ISSN: 2041-1723 Open Access Life Sciences

Authors (17)

R

Ruian Zhang

C

Chen Lin

School of Pharmaceutical Sciences

H

Hongliang Dong

Center for High Pressure Science and Technology Advanced Research

H

Haojie Han

Y

Yu Song

Department of Chemistry, College of Science

Y

Yiran Sun

Y

Yue Wang

Z

Zijun Zhang

X

Xiaohe Miao

Y

Yongjun Wu

Z

Zhe Ren

Q

Qiaoshi Zeng

H

Houbing Huang

J

Jing Ma

State Key Laboratory of Coordination Chemistry, School of Chemistry

H

He Tian

Center of Electron Microscopy, School of Materials Science and Engineering, Zhejiang University, Hangzhou, China.

Z

Zhaohui Ren

G

Gaorong Han