Compositionally-graded ferroelectric thin films by solution epitaxy produce excellent dielectric stability
R
Ruian Zhang
C
Chen Lin
(School of Pharmaceutical Sciences)
H
Hongliang Dong
(Center for High Pressure Science and Technology Advanced Research)
H
Haojie Han
Y
Yu Song
(Department of Chemistry, College of Science)
Y
Yiran Sun
Y
Yue Wang
Z
Zijun Zhang
X
Xiaohe Miao
Y
Yongjun Wu
Z
Zhe Ren
Q
Qiaoshi Zeng
H
Houbing Huang
J
Jing Ma
(State Key Laboratory of Coordination Chemistry, School of Chemistry)
H
He Tian
(Center of Electron Microscopy, School of Materials Science and Engineering, Zhejiang University, Hangzhou, China.)
Z
Zhaohui Ren
G
Gaorong Han
Article Details
Journal
Nature Communications
Volume / Issue
Vol. 16, Issue 1
Published
January 02, 2025
ISSN
2041-1723
Publisher
Nature Portfolio
Authors (17)
R
Ruian Zhang
C
Chen Lin
School of Pharmaceutical Sciences
H
Hongliang Dong
Center for High Pressure Science and Technology Advanced Research
H
Haojie Han
Y
Yu Song
Department of Chemistry, College of Science
Y
Yiran Sun
Y
Yue Wang
Z
Zijun Zhang
X
Xiaohe Miao
Y
Yongjun Wu
Z
Zhe Ren
Q
Qiaoshi Zeng
H
Houbing Huang
J
Jing Ma
State Key Laboratory of Coordination Chemistry, School of Chemistry
H
He Tian
Center of Electron Microscopy, School of Materials Science and Engineering, Zhejiang University, Hangzhou, China.
Z
Zhaohui Ren
G
Gaorong Han
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