Combined effects of polymer/substrate interaction and chain adsorption on the <i>T</i> g-confinement effect of supported thin polystyrene films

L Lu Bai (Beijing Key Laboratory of Solid-State Battery and Energy Storage Process, Key Laboratory of Green Process and Engineering, State Key Laboratory of Mesoscience and Process Engineering) W Weizhao Ren (Key Laboratory of Surface and Interface Science of Polymer Materials of Zhejiang Province, Department of Chemistry, Zhejiang Sci-Tech University , Hangzhou 310018,) X Xiaonan Li J Jianquan Xu (Key Laboratory of Surface and Interface Science of Polymer Materials of Zhejiang Province, Department of Chemistry, Zhejiang Sci-Tech University , Hangzhou 310018,) X Xinping Wang (State Key Laboratory of Organometallic Chemistry, Shanghai Institute of Organic Chemistry, University of Chinese Academy of Sciences)

Abstract

The thickness dependence of the glass transition temperature (i.e., the Tg-confinement effect) and its molecular weight (Mw) dependence in polystyrene (PS) thin films supported on attractive substrates are systematically investigated as a function of annealing time at 423 K. It is demonstrated that the shift in Tg (ΔTg= Tgfilm − Tgbulk) exhibits a consistent linear dependence on the degree of adsorption (hads/hadseq) across PS films with different Mw on a given substrate, described by ΔTg = khads/hadseq + b. The slope k is found to be independent of the substrate, whereas the intercept b increases with the increasing polymer/substrate interactions due to additional losses in interfacial free volume arising from more densely packed adsorbed conformations. In addition, the dependence of the Tg-confinement effect on Mw is observed under non-equilibrium adsorption conditions caused by Mw-dependent adsorption kinetics. These results provide physical insights into how chain adsorption, which is strongly modulated by polymer/substrate interactions, affects the Tg-confinement effect in polymer thin films.

Article Details

Volume / Issue Vol. 164, Issue 1
Published January 07, 2026
ISSN 0021-9606
Publisher American Institute of Physics

Journal Info

The Journal of Chemical Physics

American Institute of Physics

ISSN: 0021-9606 Physical Sciences

Authors (5)

L

Lu Bai

Beijing Key Laboratory of Solid-State Battery and Energy Storage Process, Key Laboratory of Green Process and Engineering, State Key Laboratory of Mesoscience and Process Engineering

W

Weizhao Ren

Key Laboratory of Surface and Interface Science of Polymer Materials of Zhejiang Province, Department of Chemistry, Zhejiang Sci-Tech University , Hangzhou 310018,

X

Xiaonan Li

J

Jianquan Xu

Key Laboratory of Surface and Interface Science of Polymer Materials of Zhejiang Province, Department of Chemistry, Zhejiang Sci-Tech University , Hangzhou 310018,

X

Xinping Wang

State Key Laboratory of Organometallic Chemistry, Shanghai Institute of Organic Chemistry, University of Chinese Academy of Sciences