Chip‐Scale Graphene/IGZO Cold Source FET Array Enabling Sub‐60 mV dec <sup>−1</sup> Super‐Steep Subthreshold Swing
Abstract
Abstract In this study, the first sub‐60 mV dec −1 super‐steep subthreshold swing (SS) of graphene/InGaZnO (IGZO) cold‐source field‐effect transistor (CSFET) arrays is demonstrated. The linear density of states of the Dirac‐cone‐type graphene suppresses the Boltzmann thermal tail near the graphene/IGZO interface which in turn causes super‐exponentially decaying electron density with increasing energy, leading to an extremely low off current and SS value. In particular, by introducing an HfO 2 high‐k dielectric with a low body factor, the surface potential is effectively modulated, further reducing SS by ≈46.4 mV dec −1 . Furthermore, highly uniform sub‐60 mV dec −1 SS with a yield of ≈89.1% is achieved in the IGZO CSFET 8 × 8 array devices, with a record SS value of 23.66 mV dec −1 compared to previously reported oxide‐semiconductor transistors. The proposed IGZO CSFET device is expected to drive significant advancements in high‐speed and ultralow‐power electronic circuits.
Article Details
Authors (14)
Seyoung Oh
Department of Advanced Materials Engineering Chungbuk National University Chungdae‐ro 1, Seowon‐Gu Cheongju Chungbuk 28644 Republic of Korea
Ojun Kwon
Department of Advanced Materials Engineering Chungbuk National University Chungdae‐ro 1, Seowon‐Gu Cheongju Chungbuk 28644 Republic of Korea
Jongwon Yoon
Eunjeong Cho
Min Jeong Kim
Wondeok Seo
Department of Advanced Materials Engineering Chungbuk National University Chungdae‐ro 1, Seowon‐Gu Cheongju Chungbuk 28644 Republic of Korea
MinHee Kim
Shinhoi Kim
Department of Advanced Materials Engineering Chungbuk National University Chungdae‐ro 1, Seowon‐Gu Cheongju Chungbuk 28644 Republic of Korea
Yeongeun Kwon
Department of Advanced Materials Engineering Chungbuk National University Chungdae‐ro 1, Seowon‐Gu Cheongju Chungbuk 28644 Republic of Korea
Yung Joon Jung
Department of Mechanical and Industrial Engineering Northeastern University Boston MA 02115 USA
Kyungrok Kang
DRAM Yield Enhancement Team Samsung Electronics 1‐1, Samsungjeonja‐ro Hwasung‐City Gyeonggi‐do 18448 Republic of Korea
Woojin Park
Yonghun Kim
Byungjin Cho
Department of Advanced Materials Engineering Chungbuk National University Chungdae‐ro 1, Seowon‐Gu Cheongju Chungbuk 28644 Republic of Korea