Chemical Control of Symmetry and Bandgap in Tungsten Oxyhalide van der Waals Semiconductors
Article Details
Journal Info
Journal of the American Chemical Society
American Chemical Society
Authors (25)
Jordan Cox
Department of Chemistry
Willa Mihalyi-Koch
Department of Chemistry
Sophie Beck
Center for Computational Quantum Physics
Eric Seewald
Department of Physics
Asish K. Kundu
National Synchrotron Light Source II
Zhi-Hao Cui
Department of Chemistry
Till Schertenleib
Laboratory for Functional Inorganic Materials (LFIM), Institute of Chemical Sciences and Engineering (ISIC)
Chun-Ying Huang
Department of Chemistry
Yinming Shao
Department of Physics
Siyuan Qiu
Department of Physics
Chiara Trovatello
Department of Mechanical Engineering
Daniel G. Chica
Department of Chemistry
Xiong Huang
Department of Physics
Xiaoyu Song
Department of Chemistry
André Koch Liston
Department of Chemistry
Michael E. Ziebel
Department of Chemistry
Elio Vescovo
National Synchrotron Light Source II
Milan Delor
Department of Chemistry
P. James Schuck
David R. Reichman
Department of Chemistry
Xiaoyang Zhu
Department of Chemistry
S. J. L. Billinge
Department of Applied Physics and Applied Mathematics
Dmitri N. Basov
Abhay N. Pasupathy
Xavier Roy