Charge accumulation and solvation in <i>β</i> -NiOOH: Surface chemistry of an OER catalyst from ML-aided simulations

A Andrea Silva (CNR-IOM, Consiglio Nazionale delle Ricerche–Istituto Officina dei Materiali 1 , c/o SISSA, Via Bonomea 265, 34136 Trieste,) D Detre Teschner (Department of Heterogeneous Reactions) T Travis Jones (Department of Inorganic Chemistry, Fritz-Haber-Institute of the Max-Planck-Society 3 , Berlin,) S Simone Piccinin (Consiglio Nazionale delle Ricerche)

Abstract

Electrochemical water splitting is a key technology for a sustainable energy transition, providing a route to store surplus electricity from renewable sources. A central bottleneck is the sluggish oxygen evolution reaction (OER), which drives the search for catalysts that are active, stable, and inexpensive enough for large-scale deployment. Within this context, pure and doped NiOxHy combine high activity with low cost, making them prime candidates for alkaline OER. Yet, despite extensive study, the atomistic structure of NiOOH under operando conditions and the associated reaction mechanisms remain debated. Here, we investigate the structural complexity of pure β-NiOOH, the scaffold for its doped derivatives. We systematically investigate the oxidation of the surface adsorbates via proton-coupled electron transfer steps across relevant facets and sites, identifying the most probable sequence of deprotonation events. Our results reveal asymmetric charge accumulation on Wulff-relevant surfaces and show how applied potential can promote morphological restructuring. Explicit solvation is included through machine-learning interatomic potential molecular dynamics of the NiOOH/water interface, which allows us to resolve the hydrophobic and hydrophilic character of different surfaces and the associated interfacial water structure. Together, these insights demonstrate how surface chemistry and solvation jointly govern the stability of NiOOH and the accumulation of surface charge, with possible implications for catalytic performance.

Article Details

Volume / Issue Vol. 164, Issue 1
Published January 07, 2026
ISSN 0021-9606
Publisher American Institute of Physics

Journal Info

The Journal of Chemical Physics

American Institute of Physics

ISSN: 0021-9606 Physical Sciences

Authors (4)

A

Andrea Silva

CNR-IOM, Consiglio Nazionale delle Ricerche–Istituto Officina dei Materiali 1 , c/o SISSA, Via Bonomea 265, 34136 Trieste,

D

Detre Teschner

Department of Heterogeneous Reactions

T

Travis Jones

Department of Inorganic Chemistry, Fritz-Haber-Institute of the Max-Planck-Society 3 , Berlin,

S

Simone Piccinin

Consiglio Nazionale delle Ricerche