Bis(silylene)‐Mediated N═N Bond Scission of Diazo Compounds
Abstract
ABSTRACT Diazo compounds, >C═N═N, typically undergo C═N bond cleavage to form carbenes and N 2 , whereas direct N═N bond breaking remains exceedingly rare in main‐group chemistry. We report the N═N bond scission of diazodiarylmethanes, Ar 2 C═N═N (Ar = phenyl, Ar 2 C = 9,9‐fluorendiyl), mediated by a chelating bis‐NHSi (NHSi = N‐heterocyclic silylene). Three bis‐NHSi scaffolds with tunable Si···Si distances were examined: While XT(LSi:) 2 (XT = 9,9‐dimethyl‐9H‐xanthene‐4,5‐diyl, L = PhC(tBuN) 2 ) and PhN(LSi:) 2 lead to end‐on addition products with partial N═N bond activation, the carborane‐based CB(LSi:) 2 (CB = 1,2‐C 2 B 10 H 10 ) engenders complete N═N bond cleavage to afford isolable disilicon nitrido imino species containing a Si═N─Si─N═CAr 2 unit that hydrolyzes to Ar 2 C═NH, NH 3 , SiO 2 , C 2 B 10 H 12 , and LH. According to density functional theory (DFT) calculations, the N═N cleavage stems from a unique cooperative interaction of the two divalent silicon centers.
Article Details
Authors (3)
Yun Xiong
Shenglai Yao
Metalorganics and Inorganic Materials, Department of Chemistry, Technical University of Berlin, Straße des 17. Juni 135, Secr. C2, 10623 Berlin, Germany
Matthias Driess
Metalorganics and Inorganic Materials, Department of Chemistry, Technical University of Berlin, Straße des 17. Juni 135, Secr. C2, 10623 Berlin, Germany