Atomic order induced reduction of Gilbert damping constant and enhancement of half-metallicity in off-stoichiometric Co2FeGa0.5Ge0.5 Heusler alloy thin films

M Madhav M. Bhat (Department of Physics, Indian Institute of Technology Guwahati 1 , Guwahati 781039,) K K. Simalaotao (Research Center for Magnetic and Spintronic Materials, NIMS 2 , Tsukuba 305-0047,) H H. Suto (National Institute for Materials Science 1 , Tsukuba, Ibaraki 305-0047,) A A. Perumal (Department of Physics, Indian Institute of Technology Guwahati 1 , Guwahati 781039,) A A. Srinivasan (Department of Physics, Indian Institute of Technology Guwahati 1 , Guwahati 781039,) Y Y. Sakuraba (Department of Physics, Indian Institute of Technology Guwahati 1 , Guwahati 781039,)

Abstract

The development of energy-efficient spintronic devices with enhanced magnetoresistance demands materials with low Gilbert damping constant (α) and high half-metallicity. In this study, we report a very low α in sputter-deposited off-stoichiometric Co2FeGa0.5Ge0.5 (CFGG) Heusler alloy thin films and investigate the relation between α and atomic ordering and half-metallicity. CFGG thin films with a composition of Co44.3Fe30.7Ga13.9Ge11.1 were epitaxially deposited on MgO (001) substrates by magnetron sputtering followed by in situ annealing. The density of states calculations revealed that this composition has higher half-metallicity than the stoichiometric composition, owing to Fermi energy tuning. As-deposited and 400 °C-annealed samples exhibited B2-type partially disordered structure, while annealing above 500 °C induced a L21-type ordered structure. The improvement in atomic order resulted in the reduction of α, as demonstrated by ferromagnetic resonance measurement, and enhancement in half-metallicity, as revealed by anisotropic and ordinary magnetoresistance measurements. The 600 °C-annealed samples exhibited an intrinsic α of (3.5 ± 0.3) × 10−4, the low value reported for metallic ferromagnetic materials, demonstrating the potential for its use in energy-efficient spintronic devices.

Article Details

Volume / Issue Vol. 138, Issue 4
Published July 28, 2025
ISSN 0021-8979
Publisher American Institute of Physics

Journal Info

Journal of Applied Physics

American Institute of Physics

ISSN: 0021-8979 Physical Sciences

Authors (6)

M

Madhav M. Bhat

Department of Physics, Indian Institute of Technology Guwahati 1 , Guwahati 781039,

K

K. Simalaotao

Research Center for Magnetic and Spintronic Materials, NIMS 2 , Tsukuba 305-0047,

H

H. Suto

National Institute for Materials Science 1 , Tsukuba, Ibaraki 305-0047,

A

A. Perumal

Department of Physics, Indian Institute of Technology Guwahati 1 , Guwahati 781039,

A

A. Srinivasan

Department of Physics, Indian Institute of Technology Guwahati 1 , Guwahati 781039,

Y

Y. Sakuraba

Department of Physics, Indian Institute of Technology Guwahati 1 , Guwahati 781039,