Atomic Layer Deposition Stabilizes Nanocrystals, Enabling Reliably High‐Performance Quantum Dot LEDs

H Haoyue Wan (Department of Chemistry, Northwestern University, 2145 Sheridan Rd, Evanston, Illinois 60208, United States) P Pan Xia E Euidae Jung (Department of Electrical and Computer Engineering University of Toronto 10 King's College Road Toronto Ontario M5S 3G4 Canada) M Muhammad Imran R Ruiqi Zhang Y Yiqing Chen (Department of Chemistry) J Julian A. Steele S Sabah Gaznaghi (Australian Institute for Bioengineering and Nanotechnology The University of Queensland Brisbane QLD 4072 Australia) Y Yanjiang Liu (Department of Electrical and Computer Engineering University of Toronto 10 King's College Road Toronto Ontario M5S 3G4 Canada) Y Ya‐Kun Wang (Institute of Functional Nano & Soft Materials (FUNSOM) Jiangsu Key Laboratory For Carbon‐Based Functional Materials & Devices State Key Laboratory of Bioinspired Interfacial Materials Science Soochow University Suzhou Jiangsu China) L Lianzhou Wang (Nanomaterials Centre, School of Chemical Engineering and Australian Institute for Bioengineering and Nanotechnology) Y Yu‐Ho Won (Samsung Advanced Institute of Technology Samsung Electronics Suwon Republic of Korea) K Kwang‐Hee Kim (Samsung Advanced Institute of Technology Samsung Electronics Suwon Republic of Korea) V Vladimir Bulović S Sjoerd Hoogland (The Alliance for AI-Accelerated Materials Discovery (A3MD)) E Edward H. Sargent

Abstract

AbstractQuantum dot light‐emitting diodes (QD‐LEDs) with stable high efficiencies are crucial for next‐generation displays. However, uncontrollable aging, where efficiency initially increases during storage (positive aging) but is entirely lost upon extended aging (negative aging), hinders further device development. It is uncovered that it is chemical changes to nanocrystal (NC)‐based electron transport layer (ETL) that give rise to positive aging, their drift in structure and morphology leading to transiently improved charge injection balance. Using grazing‐incidence small‐angle X‐ray scattering, it is found that ZnMgO NCs undergo size‐focusing ripening during aging, improving size uniformity and creating a smoother energy landscape. Electron‐only device measurements reveal a sevenfold reduction in trap states, indicating enhanced surface passivation of ZnMgO. These insights, combined with density functional theory calculations of ZnMgO surface binding, inspire an atomic layer deposition (ALD) strategy with Al₂O₃ to permanently suppress surface traps and inhibit NC growth, effectively eliminating aging‐induced efficiency loss. This ALD‐engineered ZnMgO ETL enables reproducible external quantum efficiencies (EQEs) of 17% across 30 batches of LEDs with a T60 of 60 h at an initial luminance of 4500 cd m−2, representing a 1.6‐fold increase in EQE and a tenfold improvement in operating stability compared to control devices.

Article Details

Volume / Issue Vol. 37, Issue 11
Published March 01, 2025
ISSN 0935-9648
Publisher Unknown Publisher

Journal Info

Advanced Materials

Unknown Publisher

ISSN: 0935-9648 Physical Sciences

Authors (16)

H

Haoyue Wan

Department of Chemistry, Northwestern University, 2145 Sheridan Rd, Evanston, Illinois 60208, United States

P

Pan Xia

E

Euidae Jung

Department of Electrical and Computer Engineering University of Toronto 10 King's College Road Toronto Ontario M5S 3G4 Canada

M

Muhammad Imran

R

Ruiqi Zhang

Y

Yiqing Chen

Department of Chemistry

J

Julian A. Steele

S

Sabah Gaznaghi

Australian Institute for Bioengineering and Nanotechnology The University of Queensland Brisbane QLD 4072 Australia

Y

Yanjiang Liu

Department of Electrical and Computer Engineering University of Toronto 10 King's College Road Toronto Ontario M5S 3G4 Canada

Y

Ya‐Kun Wang

Institute of Functional Nano & Soft Materials (FUNSOM) Jiangsu Key Laboratory For Carbon‐Based Functional Materials & Devices State Key Laboratory of Bioinspired Interfacial Materials Science Soochow University Suzhou Jiangsu China

L

Lianzhou Wang

Nanomaterials Centre, School of Chemical Engineering and Australian Institute for Bioengineering and Nanotechnology

Y

Yu‐Ho Won

Samsung Advanced Institute of Technology Samsung Electronics Suwon Republic of Korea

K

Kwang‐Hee Kim

Samsung Advanced Institute of Technology Samsung Electronics Suwon Republic of Korea

V

Vladimir Bulović

S

Sjoerd Hoogland

The Alliance for AI-Accelerated Materials Discovery (A3MD)

E

Edward H. Sargent