An Automated Workflow to Discover the Structure–Stability Relations for Radiation Hard Molecular Semiconductors
Article Details
Journal Info
Journal of the American Chemical Society
American Chemical Society
Authors (10)
Andreas J. Bornschlegl
Faculty of Engineering, Department of Material Science
Patrick Duchstein
Chair for Theoretical Chemistry/Computer Chemistry Center (CCC), Department of Chemistry and Pharmacy, Friedrich-Alexander-Universität Erlangen-Nürnberg (FAU), Nägelsbachstraße 25, 91052 Erlangen, Germany
Jianchang Wu
Forschungszentrum Jülich GmbH
Juan S. Rocha-Ortiz
Institute of Materials for Electronics and Energy Technology (i-MEET), Department of Materials Science and Engineering, Friedrich-Alexander-Universität Erlangen-Nürnberg (FAU), Martensstraße 7, 91058 Erlangen, Germany
Mauricio Caicedo-Reina
Heterocyclic Compounds Research Group, Department of Chemistry, Universidad del Valle, Calle 13 #100-00, 25360 Cali, Colombia
Alejandro Ortiz
Heterocyclic Compounds Research Group, Department of Chemistry, Universidad del Valle, Calle 13 #100-00, 25360 Cali, Colombia
Braulio Insuasty
Heterocyclic Compounds Research Group, Department of Chemistry, Universidad del Valle, Calle 13 #100-00, 25360 Cali, Colombia
Dirk Zahn
Computer Chemistry Center (CCC) & Interdisciplinary Center for Molecular Materials (ICMM), Friedrich-Alexander-Universität Erlangen-Nürnberg, Nägelsbachstraße 25, 91052 Erlangen, Germany
Larry Lüer
Christoph J. Brabec
Institute of Energy Materials and Devices - Photovoltaics (IMD-3)