Adsorption behavior analysis of CNCl on transition metal-doped fluorinated diamanes: A first-principles study

W Weiyao Yu (School of Mechanical Engineering, Jiangsu University of Science and Technology 1 , 666 Changhui Road, Dantu District, Zhenjiang 212100,) R Ruixiong Li (Health Sciences School of Dentistry, University of Washington, 1410 NE Campus Parkway 2 , Seattle, Washington 98195,) S Sunan Tian (IMDEA Materials Institute 4 , C/Eric Kandel, 2, 28906 Getafe, Madrid,) J Jiaming Zhao Y Yongliang Zhu P Pengcheng Zhu (Department of Chemistry)

Abstract

Cyanogen chloride (CNCl) is a toxic chemical that poses significant risks to human health and the environment; therefore, its level must be accurately monitored. Herein, the adsorption of CNCl by transition metal-doped fluorinated diamanes (F-diamanes) has been extensively studied via first-principles calculations. Key parameters such as adsorption energies, charge transfer amounts, bandgaps, sensitivity, densities of states, projected density of states, charge density differences, and recovery time were systematically analyzed. Results reveal that monometallic doping significantly enhances CNCl adsorption, with increases in adsorption energy by 164%–368% and charge transfer by 1234%–1571%, particularly in the AuFD-CNCl, AgFD-CNCl, and CuFD-CNCl systems, which demonstrated improved sensing performances. Similarly, bimetallic co-doping further strengthened adsorption, with energy enhancements of 277%–309% and charge transfer increases of 1238%–1505%. Au-CuFD-CNCl, Au-AgFD-CNCl, and Cu-AgFD-CNCl systems also showed superior sensing performances. Meanwhile, the recovery time of CNCl molecules on the AuFD, AgFD, Au-CuFD, and Au-AgFD surfaces was drastically reduced to acceptable levels at 279–412 K, leading to their desorption. Therefore, these four systems exhibited excellent reversibility properties, suggesting their applicability in gas-sensing applications. This work can facilitate the applications of doped F-diamanes in environmental conservation, energy storage, and chemical engineering.

Article Details

Volume / Issue Vol. 162, Issue 12
Published March 28, 2025
ISSN 0021-9606
Publisher American Institute of Physics

Journal Info

The Journal of Chemical Physics

American Institute of Physics

ISSN: 0021-9606 Physical Sciences

Authors (6)

W

Weiyao Yu

School of Mechanical Engineering, Jiangsu University of Science and Technology 1 , 666 Changhui Road, Dantu District, Zhenjiang 212100,

R

Ruixiong Li

Health Sciences School of Dentistry, University of Washington, 1410 NE Campus Parkway 2 , Seattle, Washington 98195,

S

Sunan Tian

IMDEA Materials Institute 4 , C/Eric Kandel, 2, 28906 Getafe, Madrid,

J

Jiaming Zhao

Y

Yongliang Zhu

P

Pengcheng Zhu

Department of Chemistry