A Shelf‐Stable Reagent for Photocatalytic Radical Pentafluorosulfanylation of Styrene Derivatives
Abstract
Abstract We have developed the first family of air‐ and moisture‐stable pentafluorosulfanylation (SF₅) reagents. Although the SF₅ group is a bioisostere of the trifluoromethyl group (CF₃)—exhibiting even greater electronegativity and lipophilicity, attributes that have earned it the nickname “super trifluoromethyl group”—the development of shelf‐stable, non‐toxic, and easy‐to‐handle SF₅‐incorporating reagents had remained elusive for over 70 years since its discovery. Our discovery enables the synthesis of per‐ and polyfluoroalkyl substances (PFAS)‐free fluorinated compounds, offering significant advantages over traditional CF₃ analogs. These new reagents exhibit promising reactivity under photochemical conditions, efficiently facilitating the formation of novel SF₅‐containing molecules. Moreover, our approach is compatible with the late‐stage functionalization of complex molecules. Mechanistic studies have provided valuable insights into the underlying reaction pathways.
Article Details
Authors (8)
Yi Yang
Lulu Han
Alexis Taponard
Universite de Lyon, CNRS, Université Claude Bernard Lyon 1, ICBMS, INSA Lyon, CPE UMR5246, 43 Bd du 11 Novembre 1918 Villeurbanne F‐69100 France
Lhoussain Khrouz
CNRS, ENS de Lyon, LCH, UMR 5182
Christophe Bucher
ENS de Lyon, CNRS UMR 5182 Laboratoire de Chimie Lyon F‐69342 France
Cyrille Monnereau
Laboratoire de Chimie, CNRS UMR 5182
Maurice Médebielle
ICBMS, INSA Lyon, CPE, UMR 5246, CNRS, Université Claude Bernard Lyon 1, Université de Lyon, 43 Bd du 11 Novembre 1918, Villeurbanne F-69100, France
Anis Tlili
LHCEP, Ariane Group, CNES, Université Claude Bernard Lyon 1