Weiyang Xu, Wenda Zhou, Daojian Ye, Xingfang Luo, Cailei Yuan, Wen Lei, Kaiyou Wang. "Tuning Cu–Cu Spacing in Single‐Atomic Layer Cu Catalysts for Efficient and Stable CO
                    <sub>2</sub>
                    ‐To‐C
                    <sub>2</sub>
                    H
                    <sub>4</sub>
                    Electroreduction." Advanced Materials (2026). https://doi.org/10.1002/adma.202522842