Kang, J., Park, S., Park, H. R., Lee, S., Kim, J., Lee, M., Narayan, D. M., Yoo, J. G., Park, G., Kim, H. S., Jung, Y. C., Choi, R., Kim, J., Kim, S. J. (2025). Thermal budget study to simultaneously achieve low-temperature (<b>&amp;lt;</b>400 <b>°</b>C) process and high endurance of ferroelectric Hf0.5Zr0.5O2 thin films. Applied Physics Letters. https://doi.org/10.1063/5.0256712