Shvilberg, L., Xue, H., Palmese, E. J., Heinrich, H. H., Kuan, J., Abad, G. C., Shukla, N., McDonnell, S. J., Wierer, J. J., Ihlefeld, J. F. (2025). Process temperature dependence of sputtered MgO/<i>n</i>-type GaN metal–oxide–semiconductor capacitors. Journal of Applied Physics. https://doi.org/10.1063/5.0276229