Yoon Joo Jeong, Hyo Jong Shin, Chang Hee Lee, Gwang Ho Lee, Ye Jun Cheon, Hee Sam Cheon, Ga Eun Hwang, In Hyeok Kho, In Young Bang, Jae Hyeon Kim, Ji Hwan Kim, Gi-Chung Kwon. "NO-driven etching behavior of SiO2 and Si3N4 in cryogenic NF3/NO plasmas." Journal of Applied Physics, 2026. doi:10.1063/5.0320386