Shuhong Li, Juiteng Chang, Keisuke Atsumi, Kosei Matsumoto, Itsuki Tanaka, Tomonori Nishimura, Kaito Kanahashi, Takahiro Nagata, Jun Nara, Yoshiki Sakuma, Emi Kano, Nobuyuki Ikarashi, Kosuke Nagashio. "MOCVD‐Grown MoS
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                    Wafers as a Transfer‐Free Platform for Top‐Gate Devices via Dry Interface Engineering." Advanced Materials, 2026. doi:10.1002/adma.73931