Sanghun Lee, Seunggi Seo, Tae Hyun Kim, Hwi Yoon, Seonyeong Park, Seunggyu Na, Jeongwoo Seo, Soo-Hyun Kim, Seung-min Chung, Hyungjun Kim. "Layer-by-layer NH3 plasma treatment for area-selective atomic layer deposition of high-quality SiO2 thin films." The Journal of Chemical Physics, 2025. doi:10.1063/5.0257779