Das, N., Alema, F., Brand, W., Katta, A., Gilankar, A., Osinsky, A., Kalarickal, N. K. (2025). <i>In situ</i> patterned damage-free etching of three-dimensional structures in β-Ga2O3 using triethylgallium. Journal of Applied Physics. https://doi.org/10.1063/5.0274126