Yuma Kato, Junji Kataoka, Ryo Saito, Daiki Iino, Kazuaki Kurihara, Tetsuya Sato, Hiroyuki Fukumizu. "<i>In situ</i>
                    analysis of SiO2 films etched under cryogenic conditions using H2/F2/Ar gas mixture plasma." Applied Physics Letters (2026). https://doi.org/10.1063/5.0303879