Liron Shvilberg, Chuanzhen Zhou, Megan K. Lenox, Benjamin L. Aronson, Nicolas K. Lam, Samantha T. Jaszewski, Elizabeth J. Opila, Jon F. Ihlefeld. "Erratum: “Oxygen diffusion coefficients in ferroelectric hafnium zirconium oxide thin films” [Appl. Phys. Lett. <b>124</b>, 252905 (2024)]." Applied Physics Letters (2025). https://doi.org/10.1063/5.0251555