Shvilberg, L., Zhou, C., Lenox, M. K., Aronson, B. L., Lam, N. K., Jaszewski, S. T., Opila, E. J., Ihlefeld, J. F. (2025). Erratum: “Oxygen diffusion coefficients in ferroelectric hafnium zirconium oxide thin films” [Appl. Phys. Lett. <b>124</b>, 252905 (2024)]. Applied Physics Letters. https://doi.org/10.1063/5.0251555