Lu, H., Che, J., Zhan, L., Wei, L., Lu, T., Chen, T., Zhang, G., Chen, X., Kong, X., Liu, H., Liu, Y., Min, J., Mo, Z., Wang, T., Jiao, X., Qiu, W., Yin, S., Liu, Z., Chen, H. (2026). Electrostatic Potential Tuning by Low‐Volatility Halogenated Additive: Boosting PTQ10‐Based Binary OPV to Near 20% Efficiency with High Scalability. Advanced Materials. https://doi.org/10.1002/adma.73887