Vikram Magendar, Yi-Ann Chen, Albert Lu, Donghun Kang, Daniel Connelly, Marek Hytha, Hideki Takeuchi, Robert Mears, Hiu Yung Wong. "Electron and hole surface roughness scattering-limited mobilities in oxygen-inserted (OI) Si channel." Journal of Applied Physics (2026). https://doi.org/10.1063/5.0316691