Jian Wei, Ni Zhen, Zuohu Zhou, Fengbo Yan, Yang Xu, Fangfang Liu, Aibing Yang, Siming Qi, Zeqi Yu, Jun Zhao, Lei Zhang. "Atomically Precise Interfacial Engineering on Tin‐Silicon Oxo Clusters for Sub‐8 nm Lithography." Angewandte Chemie International Edition, 2026. doi:10.1002/anie.202524320