3-Center-3-Electron σ-Adduct Enables Silyl Radical Transfer below the Minimum Barrier for Silyl Radical Formation - Zihang Qiu; Paolo Cleto Bruzzese; Zikuan Wang; Hao Deng; Markus Leutzsch; Christophe Farès; Sonia Chabbra; Frank Neese; Alexander Schnegg; Constanze N. Neumann (Journal of the American Chemical Society, 2025)